Meta lens fabrication & characterization tool. Fast quick-turn for meta lens prototyping, low volume production using 4'' Glass Wafer operated in non-vacuum environment. Highest 6-axis precision piezo writing stage. Super critical lens to reduce laser spot size < 100nm.
Specifications
system Dimensions
dimensions: L: 0.65m x W: 0.60m x H: 0.95m
writing Specifications
minimum Critical Dimensions: 120 - 150nm
minimum Linewidth: 90nm
laser Source: 266nm
maximum Writing Speed: 100mm/s
maximum Exposure Area: 135mm x 85mm
autofocus Compensation Range: ±100nm
minimum Surface Roughness: ≤20nm
repeatability: ±2 / ±2 / ±3nm
substrate Size: Min 1cm x 1cm or 1cm, Max 4'' x 4'' or Ø4''
facility Requirements
voltage Rating: 230VAC, 50/60Hz, Single phase, L+N+E Rated Current: 5.75A
facility A C Protection: 13.0A C Curve AIC Rating of Main Breaker: 10kA
