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Lithography

Direct-write metalens patterning at sub-100 nm resolution.

Writes metalens geometry directly onto glass substrates, no mask required, for fast iteration and small-volume runs.

From design to
substrate, fast

Our Direct Laser Writer writes metalens patterns straight onto glass, so a design moves from CAD to substrate quickly. Ideal for research, prototyping and small production runs in the visible band.

Write any design, no mask

Write any design,
no mask

Direct-write patterning takes a new metalens design from file to substrate without committing to a mask. You iterate quickly and only scale a design once it is right.

Direct Laser Writer

Direct Laser Writer

Maskless direct-write patterning for prototyping and design iteration.

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Lithography at a glance

01

Flexible wafer material

Glass, silicon and more, all supported.

Flexible wafer material
02

Fast prototyping

Design changes move from CAD to substrate quickly.

Fast prototyping
03

Broad spectral coverage

Visible, NIR and SWIR, all supported.

Broad spectral coverage
04

Prototype & low-volume

Built for prototyping and small production runs.

Prototype & low-volume
05

Research & production

Supports both lab iteration and commercial runs.

Research & production
Talk to our equipment team
Talk to our team

Talk to our equipment team

Tell us about the optics you need to pattern.

Contact us

Connect with us

Singapore (HQ)

Metaoptics Technologies Pte Ltd. 81 Ayer Rajah Crescent, #01-45 Singapore 139967

United States

Metaoptics Inc. (USA); 1 Ferry Building, Suite 201 San Francisco, CA 94111

Metaoptics Technologies Pte Ltd. All rights reserved
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