Whether you need a small batch for early-stage development or high-volume production at scale, MetaOptics provides a fabrication platform matched to your needs, from prototype to mass production.
MetaOptics offers two dedicated fabrication platforms for producing custom metalenses, giving customers the flexibility to choose the right process for their stage of development and volume requirements. Both platforms support various materials including glass and silicon, and are engineered to deliver the nanoscale precision that metalens production demands.
Our 4" platform uses the MetaOptics Direct Laser Writer to fabricate metalenses with a critical dimension of 100nm, making it the ideal choice for research, early-stage development, and lower volume production runs.
Operating in a non-vacuum environment with a high-precision stage, it offers a faster and more accessible entry point for teams looking to develop and validate custom metalens designs before committing to full-scale production.
A focused laser beam patterns the lens geometry at nanoscale resolution directly onto the substrate, enabling precise, flexible fabrication without the need for vacuum or complex lithographic masks.
Circular Lens Pattern
100nm Feature DetailOur 12" platform uses DUV immersion photolithography to deliver high-yield metalens production at scale. With a critical dimension of 80nm and an aspect ratio of 1/8 after dry etching, this platform is built for customers ready to move from development into full commercial production.
It combines the precision of semiconductor-grade lithography with the throughput needed for large-volume metalens manufacturing, making it the right choice for OEM supply chains and commercial product rollouts.
Deep ultraviolet light is projected through a liquid medium to print lens patterns onto 12" wafers at high resolution and throughput, enabling the consistent, repeatable fabrication required for mass production and high-yield supply.
Not sure which platform fits your project? Use this as a starting guide. Our team can help you determine the right fabrication approach based on your application, timeline, and volume requirements.
| Feature | 4" Platform | 12" Platform |
|---|---|---|
| Fabrication Technique | Direct Laser Writing | DUV Immersion Photolithography |
| Critical Dimension | 100 nm | 80 nm |
| Wafer Size | 4" (Glass, Silicon, Etc.) | 12" (Glass, Silicon, Etc.) |
| Production Volume | Low Volume | Mass Production, High Yield |
| Environment | Non-Vacuum | Semiconductor-Grade |
| Aspect Ratio | Standard | 1/8 After Dry Etching |
| Best For | R&D, Fast Prototyping, Design Validation | OEM Supply, Commercial Production, Scale-Up |
Connect with us
Singapore (HQ)
Metaoptics Technologies Pte Ltd. 81 Ayer Rajah Crescent, #01-45 Singapore 139967
United States
Metaoptics Inc. (USA); 1 Ferry Building, Suite 201 San Francisco, CA 94111
